Analyzing High-NA Objective Lens Focusing

High-NA objective lenses are widely used in optical lithography, microscopy, etc. Consideration of the vectorial nature of light in the simulation of the focusing is therefore fundamental. VirtualLab Fusion supports both ray and field tracing analysis of such lenses with great ease. With field tracing, the asymmetric focal spot can be clearly demonstrated, which stems from the vectorial effects. The camera detector and the electromagnetic field detector provide full flexibility in the investigation of the field in focal region, with insights into the vectorial effect.

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