Optical System for Inspection of Micro-Structured Wafer

Abstract


In the semiconductor industry, wafer inspection systems are used to detect defects on a wafer and find their positions. To ensure the necessary image resolution for the microstructures, the inspection system often employs a high-NA objective and works in the UV wavelength range. As an example, a complete wafer inspection system including high-NA focusing and light interaction with microstructures is modeled, and the formation of the image is demonstrated.

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