Ellipsometry is an optical measurement method which is commonly used to determine the dielectric properties of thin films. The measurement involves determining the change in the polarization state of light upon reflection or transmission from the sample, for different wavelengths and angles of incidence. Hence, it can be used to characterize the composition, roughness, thickness, crystalline properties, electrical conductivity, and other material properties. It is very sensitive to changes in the optical response of the incident radiation interacting with the material under study. This use case demonstrates the basic principles of ellipsometry and illustrates the use of the built-in ellipsometry analyzer in VirtualLab Fusion.
- Use Case (PDF) pdf 23.02.23
- Use Case and sample files in VirtualLab Fusion (ZIP) zip 23.02.23