Variable Angle Spectroscopic Ellipsometry (VASE) Analysis of a SiO2-Coating

Due to its high sensitivity to small changes in optical parameters, variable angle spectroscopic ellipsometry (VASE) is a commonly applied technology in many applications where thin-film structures are used, such as semiconductors, optical coatings, data storage, flat panel fabrication, etc. In this Use Case we demonstrate the use of the Ellipsometry Analyzer in VirtualLab Fusion on a silicon dioxide (SiO2) coating. For the parameters of the system, we follow the work of Woollam et al. “Overview of variable-angle spectroscopic ellipsometry (VASE): I. Basic theory and typical applications” and investigate how sensitive the method is towards slightly varying layer thicknesses.