Analyzing High-NA Objective Lens Focusing
Abstract
High-NA objective lenses are widely used in optical lithography, microscopy, etc. Consideration of the vectorial nature of light in the simulation of the focusing is therefore fundamental.
VirtualLab Fusion supports both ray and field tracing analysis of such lenses with great ease. With field tracing, the asymmetric focal spot can be clearly demonstrated, which stems from the vectorial effects. The camera detector and the electromagnetic field detector provide full flexibility in the investigation of the field in focal region, with insights into the vectorial effect.
VirtualLab Fusion Configuration
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VirtualLab Fusion
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Use Case
Imaging of Sub-Wavelength Gratings by Using Vector Beam Illumination
A high-NA microscope for imaging of sub-wavelength grating is build up, and the influences from illumination with linear, radial, and azimuthal polarizations is investigated.
Use Case
Optical System for Inspection of Micro-Structured Wafer
A complete wafer inspection system including high-NA focusing effect and light interaction with microstructures is modeled, and the formation of image is demonstrated.