Talbot Lithography

The Talbot effect, as one of the most well-known diffraction effects, can be used in lithography to produce periodic nanostructures. Following the work of I.-H. Lee et al., we construct a conical grating mask on a hexagonal grid, and simulate the generation of Talbot images in a depth-wise manner. Particularly, since the UV light employed in the lithography process is unpolarized, we demonstrate, at examples, how to model unpolarized light for grating simulation in VirtualLab Fusion.

Talbot Images of A Conical Phase Mask

A phase mask with a layer of cones is modeled in VirtualLab Fusion. Different Talbot images are detected such that the pillar patterns are in the primary image plane while the hole patterns appear in the secondary image plane.

Unpolarized Light for Grating Simulation – Discussion at Examples

It is shown how to model the effect of unpolarized light, as the average of two orthogonal polarization states, for grating simulation in VirtualLab Fusion.

Register For Our Next Webinar

Register For Our Next Webinar