Examples of Elements Fabricated with E-Beam Lithography
Micro lens arrays are of fundamental importance for various applications. Together with our partners we are able to deliver micro lens arrays with various specifications.
Binary diffractive elements often deliver sufficient results for a low price.
This structure possesses four height levels and a feature size of only 400 nm. This challenging fabrication technique is the base for the realization of non-paraxial field manipulations. Our partner, Dr. Kley’s group at the Institute of Applied Physics, is one of the leading institutions in this field.
Proximity mask for photo lithography. Four height values and a binary transmission mask are combined to optimize the light pattern in proximity printing.